We have developed a MEMS-based testing stage that can quantitatively characterize both the electrical and mechanical
properties of nanocrystalline metal films. This stage, which is SEM and TEM compatible, is a modified version of an
earlier MEMS-based tensile testing stage (M. A. Haque and M. T. A. Saif, Proc. Natl. Acad. Sci., 101(17), 6335-6340
(2004)). This modified stage requires a simpler fabrication procedure, involving fewer lithography and etching steps,
and has higher yield compared to the earlier version. It allows for 4-point electrical resistivity measurement, and in-situ
tensile testing in SEM and TEM of free-standing nano-scale metal films. The stage was used to perform a tensile test on
a 100-nm-thick aluminum film and electrical resistivity measurement on a 110-nm-thick aluminum film, the results of
which are described.
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