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Jaehui Choe
at SAMSUNG Electronics Co Ltd
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Publications (1)
Proceedings Article | 9 April 2024 Poster + Paper
Prediction of lithographic performance upon the adjustment of EUV photoresist components by advanced contrast curve analysis
Eunkyoung Byun, Sukmin Kim, Seungwon Han, Jaehui Choe, Seongji Kwon, Junghoon Lee, Sam-Jong Choi
Proceedings Volume 12957, 129571O (2024) https://doi.org/10.1117/12.3009950
KEYWORDS: Photoresist materials, Photoacid generators, Film thickness, Photoresist developing, Extreme ultraviolet lithography, Image processing, Lithography, Nanoimprint lithography, Coating thickness, Advanced patterning
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