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Claire Baek
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Publications (4)
SPIE Journal Paper | 19 September 2014
Real-time inspection system utilizing scatterometry pupil data
JM3, Vol. 13, Issue 04, 041403, (September 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041403
KEYWORDS: Scatterometry, Finite element methods, Inspection, Metrology, Diffraction gratings, Scanning electron microscopy, Diffraction, Critical dimension metrology, Computing systems, Manufacturing
Proceedings Article | 2 April 2014 Paper
Real-time inspection system utilizing scatterometry pupil data
Proceedings Volume 9050, 905019 (2014) https://doi.org/10.1117/12.2046518
KEYWORDS: Scatterometry, Finite element methods, Inspection, Metrology, Diffraction gratings, Diffraction, Scanning electron microscopy, Statistical analysis, Manufacturing, Computer simulations
Proceedings Article | 10 April 2013 Paper
Enhancing metrology by combining spatial variability and global inference
Proceedings Volume 8681, 86813E (2013) https://doi.org/10.1117/12.2021912
KEYWORDS: Metrology, Semiconducting wafers, Statistical analysis, Critical dimension metrology, Process control, Scatterometry, Scanning electron microscopy, Mathematical modeling, Statistical modeling, Semiconductor manufacturing
Proceedings Article | 5 April 2012 Paper
Optimization of blended virtual and actual metrology schemes
Proceedings Volume 8324, 83241K (2012) https://doi.org/10.1117/12.916313
KEYWORDS: Metrology, Scanning electron microscopy, Semiconducting wafers, Data modeling, Statistical analysis, Time metrology, Error analysis, Manufacturing, Semiconductor manufacturing, Plasma etching
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