Hung Tran
at DuPont Electronics & Industrial
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Poster
Suzanne Coley, Jong Keun Park, Emad Aqad, Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu, Rochelle Rena, Jason Behnke, Karen Petrillo
Proceedings Volume 12957, 129571Y (2024) https://doi.org/10.1117/12.3010919
KEYWORDS: Extreme ultraviolet, Stochastic processes, Etching, Photoresist processing, Photons, Manufacturing, Lithography, Design and modelling, Optical lithography, Materials processing

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