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Hung-Chang Szu
at Nanya Technology Corp
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Publications (1)
Proceedings Article | 20 October 2020 Presentation + Paper
Patterning solutions for NTD contact hole levels in advanced DRAM nodes
Michael Green, Tsu-Wen Huang, Mohamed Ramadan, Hung-Chang Szu, Yeu Dong Gau, Chih-Ying Tsai, Young Ham, Chun-Cheng Liao, Lucien Bouchard, Eric Huang, Wei-Cheng Shiu, Chris Progler
Proceedings Volume 11518, 115180N (2020) https://doi.org/10.1117/12.2574713
KEYWORDS: Photomasks, Optical lithography, Semiconducting wafers, Lithography, Optical proximity correction, Immersion lithography, 193nm lithography, Critical dimension metrology
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