Dr. Hiroshi Sakaue Profile

Dr. Hiroshi Sakaue

at Fujitsu Ltd

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 23 March 2006 Paper

Assessment of electron projection lithography mask membrane image placement accuracy due to fabrication processes

Michael Boruszewski, Roxann Engelstad, Gerald Dicks, Hiroshi Sakaue, Hiroshi Arimoto

Proceedings Volume 6151, 61511J (2006) https://doi.org/10.1117/12.657659

KEYWORDS: Photomasks, Picosecond phenomena, Silicon carbide, Mask making, Metrology, Electron beam lithography, Projection lithography, Image processing, 3D modeling, Etching

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Proceedings Article | 23 March 2006 Paper

Advanced Image Placement Performance for the Current EPL Masks

Hideyuki Eguchi, Hiroshi Sugimura, Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Kentaro Ogawa, Takashi Susa, Shinji Kunitani, Toshiaki Kurosu, Takashi Yoshii, Kojiro Itoh, Akira Tamura

Proceedings Volume 6151, 61511G (2006) https://doi.org/10.1117/12.655423

KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Photoresist processing, Mask making, Optical alignment, Image processing, Silicon, Process control, Reactive ion etching

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Proceedings Article | 28 June 2005 Paper

Local IP evaluations of EPL reticle with 4 mm-sq Si membranes

Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Tukasa Yamazaki, Hiroshi Sugimura, Takashi Susa, Kojiro Ito, Akira Tamura

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617467

KEYWORDS: Reticles, Distortion, Semiconducting wafers, Photomasks, Silicon, Metrology, Electron beam lithography, Optical alignment, Data corrections, Overlay metrology

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Proceedings Article | 6 May 2005 Paper

The improvement of the overlay accuracy using the reticle distortion correction for EPL technologies

Kaoru Koike, Hiroshi Sakaue, Hiroshi Arimoto, Akira Tamura, Takashi Susa, Kojiro Ito

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599332

KEYWORDS: Distortion, Reticles, Metrology, Photomasks, Semiconducting wafers, Time metrology, Electron beam lithography, Silicon, Optical alignment, Overlay metrology

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Proceedings Article | 6 May 2005 Paper

EPL performance in 65-nm node metallization technology and beyond

F. Koba, T. Tsuchida, H. Sakaue, K. Koike, J. Yamamoto, N. Iriki, H. Yamashita, S. Kageyama, T. Nasuno, E. Soda, K. Takeda, H. Kobayashi, F. Shoji, H. Okamura, Y. Matsubara, H. Arimoto

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599257

KEYWORDS: Metals, Transmission electron microscopy, Lithography, Scanners, Copper, Scanning electron microscopy, Resistance, Electron beam lithography, Overlay metrology, Chemical mechanical planarization

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Proceedings Article | 20 May 2004 Paper

Preliminary results of EB stepper in the application of 65-nm process

Hiroshi Takenaka, Kaoru Koike, Takahiro Tsuchida, Fumihiro Koba, Hiroshi Sakaue, Masaki Yamabe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534875

KEYWORDS: Metals, Resistance, Overlay metrology, Lithography, Photomasks, Distortion, Copper, Photography, Electron beam lithography, Optical lithography

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Proceedings Article | 20 May 2004 Paper

Performance and stability of electron projection lithography tool

Hiroshi Sakaue, Kaoru Koike, Hiroshi Takenaka, Takahiro Tsuchida, Fumihiro Koba, Masaki Yamabe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534892

KEYWORDS: Distortion, Reticles, Semiconducting wafers, Photomasks, Optical alignment, Overlay metrology, Electron beam lithography, Projection lithography, Lithography, Data corrections

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Proceedings Article | 20 May 2004 Paper

Design rule of hole-layer for electron projection lithography

Kaoru Koike, Hiroshi Sakaue, Hiroshi Takenaka, Fumihiro Koba, Takahiro Tsuchida, Masaki Yamabe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534868

KEYWORDS: Photomasks, Electron beam lithography, Projection lithography, Lithography, Finite element methods, Semiconducting wafers, Critical dimension metrology, Optical lithography, Semiconductors, Optical simulations

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Showing 5 of 8 publications

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