Prof. Hai Deng Profile

Prof. Hai Deng

at Fudan University

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 23 March 2020 Paper

Block copolymers with a fluoro-block for 5 nm DSA patterning application

Xuemiao Li, Zhilong Li, Le Dai, Hui Cao, Hai Deng

Proceedings Volume 11326, 113261E (2020) https://doi.org/10.1117/12.2543121

KEYWORDS: Annealing, Directed self assembly, Optical lithography, Liquid crystals, Scanning electron microscopy, X-rays

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Proceedings Article | 13 March 2018 Paper

Fast annealing DSA materials designed for sub-5 nm resolution

Hai Deng, Xuemiao Li, Yu Peng, Jianuo Zhou

Proceedings Volume 10586, 105861E (2018) https://doi.org/10.1117/12.2307288

KEYWORDS: Annealing, Directed self assembly, Polymerization, Polymers, Stars

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Proceedings Article | 26 March 2008 Paper

Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithography

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Heidi Cao, Hai Deng, Michael Leeson

Proceedings Volume 6923, 69230S (2008) https://doi.org/10.1117/12.772174

KEYWORDS: Line edge roughness, Monte Carlo methods, Diffusion, Lithography, Chemically amplified resists, Image processing, Electron beams, Extreme ultraviolet, Electron beam lithography, Extreme ultraviolet lithography

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SPIE Journal Paper | 1 October 2007

Exposure dose dependence on line edge roughness of a latent image in electron beam/extreme ultraviolet lithographies studied by Monte Carlo technique

Akinori Saeki, Takahiro Kozawa, Seiichi Tagawa, Heidi Cao, Hai Deng, Michael Leeson

JM3, Vol. 6, Issue 04, 043004, (October 2007) https://doi.org/10.1117/12.10.1117/1.2792178

KEYWORDS: Line edge roughness, Monte Carlo methods, Lithography, Molecules, Diffusion, Image enhancement, Electron beam lithography, Ionization, Electron beams, Polymers

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Proceedings Article | 15 March 2007 Paper

Phenolic molecular glasses as resists for next-generation lithography

Xavier André, Jin Kyun Lee, Anuja De Silva, Nelson Felix, Christopher Ober, Heidi Cao, Hai Deng, Hiroto Kudo, Daisuke Watanabe, Tadatomi Nishikubo

Proceedings Volume 6519, 65194B (2007) https://doi.org/10.1117/12.722919

KEYWORDS: Glasses, Lithography, Magnesium, Photoresist materials, Electron beam lithography, Deep ultraviolet, Photoresist developing, Polymers, Extreme ultraviolet, Semiconducting wafers

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Proceedings Article | 29 March 2006 Paper

Molecular glass resists for next generation lithography

Daniel Bratton, Ramakrishnan Ayothi, Nelson Felix, Heidi Cao, Hai Deng, Christopher Ober

Proceedings Volume 6153, 61531D (2006) https://doi.org/10.1117/12.656630

KEYWORDS: Glasses, Lithography, Bridges, Electron beam lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Line edge roughness, Magnesium, FT-IR spectroscopy

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Proceedings Article | 29 March 2006 Paper

Fundamentals of the reaction-diffusion process in model EUV photoresists

Kristopher Lavery, Kwang-Woo Choi, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-li Wu, Sushil Satija, Michael Leeson, Heidi Cao, George Thompson, Hai Deng, David Fryer

Proceedings Volume 6153, 615313 (2006) https://doi.org/10.1117/12.656831

KEYWORDS: Photoresist materials, Reflectivity, Interfaces, Diffusion, Polymers, Line width roughness, Process modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography

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Proceedings Article | 4 May 2005 Paper

Materials for future lithography

Seung Wook Chang, Da Yang, Junyan Dai, Nelson Felix, Daniel Bratton, Kousuke Tsuchiya, Young-Je Kwark, Juan-Pablo Bravo-Vasquez, Christopher Ober, Heidi Cao, Hai Deng

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.607235

KEYWORDS: Glasses, Line edge roughness, Extreme ultraviolet lithography, Electron beam lithography, Lithography, Extreme ultraviolet, Polymers, Silicon, Chemical elements, Molecules

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Proceedings Article | 4 May 2005 Paper

Inorganic polymer resists for EUVL

Juan Pablo Bravo-Vasquez, Young-Je Kwark, Christopher Ober, Heidi Cao, Hai Deng

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600172

KEYWORDS: Silicon, Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Absorbance, Lithography, Electron beam lithography, Chlorine, Humidity, Nitrogen

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Proceedings Article | 14 May 2004 Paper

Silicon backbone polymers as EUV resists

Juan Pablo Bravo-Vasquez, Young-Je Kwark, Christopher Ober, Heidi Cao, Hai Deng, Robert Meagley

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536438

KEYWORDS: Silicon, Polymers, Chlorine, Extreme ultraviolet, Polymerization, Lithography, Nitrogen, Absorbance, Transparency, Extreme ultraviolet lithography

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Proceedings Article | 12 June 2003 Paper

Novel silicon-containing polymers as photoresist materials for EUV lithography

Young-Je Kwark, Juan-Pablo Bravo-Vasquez, Christopher Ober, Heidi Cao, Hai Deng, Robert Meagley

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485184

KEYWORDS: Silicon, Polymers, Polymerization, Extreme ultraviolet lithography, Extreme ultraviolet, Ruthenium, Molybdenum, Transparency, Metals, Lithography

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Showing 5 of 11 publications

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