We investigate the limits of characterizing extreme ultraviolet (EUV) patterned features, highlighting Critical Dimension Scanning Electron Microscopes (CDSEM) and E-beam massive metrology techniques. Due to local CDU variation from EUV stochastic variations, there is increased need for multiple measurement sites in CDSEM or enlarged fields of view (FOV), leading to an increase in measurement time. Massive ebeam metrology techniques provide a robust method for imaging more features within a larger field of view. We assess the trade-off between accuracy and throughput in determining global and local CD variation. Via data sets, with matched parameters for each tool set will be analyzed at different process points to obtain local and global CD variation for statistical analysis of both techniques.
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