Dr. Fumio Murai
at JSTA
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 20 August 2004 Paper
Shigeki Mori, Akio Sato, Kyoji Nakajo, Masanori Shoji, Naomi Shimada, Hirokazu Sambayashi, Kenzo Goto, Fumio Murai, Hiroshi Fukuda
Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557820
KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Projection lithography, Software development, Silicon, Scattering, Monte Carlo methods, Optical proximity correction, Analytical research

Proceedings Article | 28 August 2003 Paper
Fumio Murai, Hiroshi Fukuda, Shigeki Mori, Akio Sato, Kyoji Nakajo
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504235
KEYWORDS: Image classification, Backscatter, Data processing, Optical aberrations, Electron beams, Data corrections, Lithography, Monochromatic aberrations, Double patterning technology, Projection lithography

Proceedings Article | 1 August 2002 Paper
Akemi Moniwa, Fumio Murai
Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476994
KEYWORDS: Photomasks, Semiconducting wafers, Scattering, Projection lithography, Reliability, Metals, Lithography, Electron beams, Electronic design automation, Analytical research

Proceedings Article | 1 July 2002 Paper
Jiro Yamamoto, Fumio Murai, Akemi Moniwa
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472270
KEYWORDS: Photomasks, Semiconducting wafers, Electron beam lithography, Lithography, Projection lithography, Distortion, Optical simulations, Chemically amplified resists, Photoresist processing, Optical lithography

Proceedings Article | 11 March 2002 Paper
Akemi Moniwa, Fumio Murai
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458368
KEYWORDS: Photomasks, Scattering, Electron beam lithography, Electron beams, Semiconducting wafers, Projection lithography, Lithography, Reliability, Analytical research, Visualization

Proceedings Article | 14 June 1996 Paper
Shou-ichi Uchino, Takumi Ueno, Sonoko Migitaka, Jiro Yamamoto, Toshihiko Tanaka, Fumio Murai, Hiroshi Shiraishi, Michiaki Hashimoto
Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241842
KEYWORDS: Lithography, Optical lithography, Scanning electron microscopy, Industrial chemicals, Diffusion, Ultraviolet radiation, Absorption, Photography, Analytical research, Photomasks

Proceedings Article | 5 April 1995 Paper
Tohru Nakamura, Takeshi Kato, Tomonori Tanoue, Fumio Murai, Mitsuo Takeda
Proceedings Volume 2400, (1995) https://doi.org/10.1117/12.206298
KEYWORDS: Waveguides, Silicon, Photonic integrated circuits, Optical interconnects, Channel waveguides, Capacitance, Integrated circuits, Neural networks, Logic devices, Resistance

Proceedings Article | 1 August 1991 Paper
Norio Saitou, Teruo Iwasaki, Fumio Murai
Proceedings Volume 1465, (1991) https://doi.org/10.1117/12.47355
KEYWORDS: Scattering, Semiconducting wafers, Carbon, Lithography, Copper, Polymethylmethacrylate, Wafer-level optics, Multiple scattering, Silicon, Quantitative analysis

Proceedings Article | 1 October 1990 Paper
Mutsuko Hatano, Toshikazu Nishino, Haruhiro Hasegawa, Fumio Murai, Tokuo Kure, Hideaki Nakane
Proceedings Volume 1287, (1990) https://doi.org/10.1117/12.20887
KEYWORDS: Superconductors, Silicon, Aluminum, Niobium, Reflection, Semiconductors, Interfaces, Resistance, Boron, Superconductivity

Showing 5 of 9 publications
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