Ms. Eun Kyung Son Profile

Eun Kyung Son

at Dongjin Semichem Co Ltd

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 29 March 2006 Paper

Parameter investigation of PEB sensitivity

Seung Keun Oh, Eun Kyung Son, Chan Sik Park, Jung Youl Lee, Jeong Woo Kim, Jae Woo Lee, Deog Bae Kim, Jaehyun Kim, Geunsu Lee, Seung-Chan Moon

Proceedings Volume 6153, 615335 (2006) https://doi.org/10.1117/12.655449

KEYWORDS: Polymers, Diffusion, Critical dimension metrology, Molecules, Photoresist processing, Monochromatic aberrations, Semiconducting wafers, Semiconductors, Lithography, Photoresist materials

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Proceedings Article | 4 May 2005 Paper

Diffusion contributions to line end shortening in 193-nm photolithography

Eun-Kyung Son, Jung-Woo Kim, Sang-Hyang Lee, Chan-Sik Park, Jae-Woo Lee, Jaehyun Kim, Geun-Su Lee, Sung-Koo Lee, Keun-Do Ban, Jae-Chang Jung, Cheol Kyu Bok, Seung-Chan Moon

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598615

KEYWORDS: Diffusion, Polymers, Photoresist materials, Optical lithography, Electrodes, Lithography, Semiconducting wafers, Resistance, Optical proximity correction, Quenching (fluorescence)

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Proceedings Article | 14 May 2004 Paper

Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist

Jung-Woo Kim, Eun-Kyung Son, Sang-Hyang Lee, Deogbae Kim, Jaehyun Kim, Geunsu Lee, Jae Chang Jung, Cheol Kyu Bok, Seung Chan Moon, Ki Soo Shin

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534675

KEYWORDS: Polymers, Photoresist processing, Lithography, Photoresist materials, Diffusion, Semiconducting wafers, Silicon, Photorefractive polymers, Scanning electron microscopy, Electronic components

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Proceedings Article | 12 June 2003 Paper

Investigation on the role of residual casting solvent in photolithographic behavior in 193-nm resists

Jae-Hyun Kang, Seung-Keun Oh, Eun-Kyung Son, Jung-Woo Kim, Yun-Hyi Kim, Yong-Jun Choi, Deog-Bae Kim, Jaehyun Kim

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485163

KEYWORDS: Diffusion, Electroluminescence, Polymers, Polymer thin films, Lithography, Semiconducting wafers, Silicon films, Molecules, Silicon, Chemically amplified resists

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