Mr. Etsuya Morita Profile

Etsuya Morita

Vice President/Business Development

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Author

Publications (8)

Proceedings Article | 12 March 2008 Paper

DFM software for photomask production and qualification of its accuracy and functionality

Frank A. J. M. Driessen, J. Westra, K. G. Haens, E. Morita

Proceedings Volume 6925, 69251T (2008) https://doi.org/10.1117/12.776666

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Design for manufacturing, Model-based design, Palladium, Image resolution, Diffraction, Calibration, Manufacturing

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Proceedings Article | 30 October 2007 Paper

Silicon-verified automatic DFM layout optimization: a calibration-lite model-based application to standard cells

Kuang-Kuo Lin, Ban Wong, Frank Driessen, Etsuya Morita, Simon Klaver

Proceedings Volume 6730, 67300X (2007) https://doi.org/10.1117/12.747021

KEYWORDS: Design for manufacturing, Lithography, Silicon, Scanning electron microscopy, Calibration, Optimization (mathematics), Semiconducting wafers, Optical proximity correction, Model-based design, Semiconductors

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Proceedings Article | 24 March 2006 Paper

Development of hot spot fixer (HSF)

Toshiya Kotani, Suigen Kyoh, Sachiko Kobayashi, Takatoshi Inazu, Atsuhiko Ikeuchi, Yukihiro Urakawa, Soichi Inoue, Etsuya Morita, Simon Klaver, Takumi Horiuchi, Johan Peeters, Satoshi Kuramoto

Proceedings Volume 6156, 61560H (2006) https://doi.org/10.1117/12.657806

KEYWORDS: Lithography, Optical proximity correction, Design for manufacturing, Metals, Resolution enhancement technologies, Photomasks, Sensors, Semiconducting wafers, Semiconductors, Design for manufacturability

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Proceedings Article | 30 July 2002 Paper

Wafer edge-shot algorithm for wafer scanners

Tsuneyuki Hagiwara, Masato Hamatani, Hideyuki Tashiro, Etsuya Morita, Shinichi Okita, Naoto Kondo

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474628

KEYWORDS: Semiconducting wafers, Motion controllers, Sensors, Scanners, Sensing systems, Critical dimension metrology, Algorithm development, Image sensors, Switches, Optimization (mathematics)

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Proceedings Article | 29 June 1998 Paper

Impacts of reticle and wafer elasticity control on overall alignment management strategy

Etsuya Morita, Masaharu Kawakubo, Frank Leung, Sean McNamara, Joseph Parry

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310779

KEYWORDS: Semiconducting wafers, Reticles, Optical alignment, Overlay metrology, Printing, Transmittance, Temperature metrology, Manufacturing, Sensors, Distortion

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Proceedings Article | 29 June 1998 Paper

Characterization of spatial coherence uniformity in exposure tools

Ilya Grodnensky, Etsuya Morita, Kyoichi Suwa, Shigeru Hirukawa

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310758

KEYWORDS: Coherence (optics), Photoresist materials, Calibration, Scanning electron microscopy, Semiconducting wafers, Spatial coherence, Scanners, Laser scanners, Laser systems engineering, Critical dimension metrology

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Proceedings Article | 8 December 1995 Paper

Evaluation of commercial and experimental resist materials for use in MEBES mask making

Charles Sauer, Robert Dean, Etsuya Morita, Zoilo Tan, Bruce Smith, Dale Ewbank, Sid Duttagupta, Anne Rudack

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228215

KEYWORDS: Etching, Polonium, Dry etching, Chemically amplified resists, Photoresist processing, Plasma etching, Plasma, Resistance, Niobium, Critical dimension metrology

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Proceedings Article | 15 February 1994 Paper

Practical approach to 0.35-um i-line lithography

Etsuya Morita

Proceedings Volume 2087, (1994) https://doi.org/10.1117/12.167283

KEYWORDS: Photomasks, Binary data, Lithography, Photomask technology, Lithographic illumination, Chlorine, Software development, Phase shifts, Electroluminescence, Optical proximity correction

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Showing 5 of 8 publications

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