Extreme ultraviolet laser ablation mass spectrometry (EUV LA-MS), developed at Colorado State University, uses EUV laser wavelengths instead of traditional visible lasers, allowing sub-micron ablation spot sizes while maintaining a good sensitivity for trace element analysis. In this paper, we have explored the capabilities of this device as a non-perturbative technique to measure the temperature of the laser-produced plasma after the laser interaction. Mass spectra obtained from silver, aluminium, gold and silicon samples were used to identify and quantify the ion population created. Additionally, the ionization ratios were calculated and input in a coronal ionization equilibrium model to calculate the effective temperature of the plasma after the ablation process. Temperatures ranging 1.35 to 1.84 eV were measured for the different materials, with heavier elements having lower temperatures than the lighter ones.
A capillary laser with output in the extreme ultra-violet at wavelength 46.9 nm is used to ablate solid targets of parylene- N (CH), PMMA, aluminum and gold. We summarize results obtained using different focusing optics: a Fresnel zone plate, an off-axis spherical multi-layer mirror and on-axis multi-layer and gold mirrors. The Fresnel zone plate has a small aperture and focuses a small fraction of the laser energy to a small diameter (< 1 μm) with peak intensities 6 x 109Wcm-2. The off-axis spherical multi-layer mirror allows for a measurement of the transmission of the laser through thin targets, but the off-axis geometry produced an aberrated focus. The on-axis multi-layer mirror allows focusing to intensities of approximately 5 x 1010 Wcm-2 with a cylindrically symmetric focus.
Heating of high energy density plasmas using extreme ultra-violet (EUV) and x-ray lasers is examined. Our modeling
studies show that solid carbon and iron can be heated by focused X-ray laser pulses of irradiance 1017 Wcm-2, duration
100 fs so that after a picosecond or so equilibration, LTE plasmas of temperatures up to 400 eV are produced in a
uniform solid density of thickness close to one micron. Solid target heating experiments can also be carried out with
laboratory based EUV lasers, but the temperatures achieved are < 20 eV. The equilibrium temperature reached with EUV
and X-ray laser heating is strongly dependent on the photon energy, while the focused irradiance determines the
thickness of heated material.
LASERIX is a high-power laser facility leading to High-repetition-rate XUV laser pumped by Titanium:Sapphire laser.
The aim of this laser facility is to offer Soft XRLs in the 30-7 nm range and auxiliary IR beam that could also be used to
produce synchronized XUV sources. This experimental configuration highly enhances the scientific opportunities of the
facility, giving thus the opportunity to realize both X-ray laser experiments and more generally pump/probe experiments,
mixing IR and XUV sources. In this contribution, the main results concerning both the development of XUV sources(X-Ray
lasers and HHG sources) and their use for applications are presented.
The evolution of the transmission of extreme ultra-violet (EUV) light from a germanium backlighter through heated thin iron targets has been measured at laser irradiances of about 8×1016 W cm-2. A rapid increase in transmission from 0 to 30% in 20 ps was observed. A two dimensional radiation hydrodynamics model was used to simulate the heating of the plasma and the transmission of EUV light as a function of time. The tamped iron targets were heated up to an average electron temperature of about 55 eV and a mass density of approximately 0.6 g cm-3. The transmission measurements are in reasonable agreement with modelling results. The experimental layout is similar to an X-ray laser experiment and therefore, for relatively low plasma temperatures, these kinds of experiments can be done in combination with X-ray laser experiments, giving transmission data for a range of wavelengths rather than a single X-ray laser wavelength.
For industrial EUV (extreme ultra-violet) lithography applications high power extreme ultraviolet (EUV) light sources are needed at a central wavelength of 13.5 nm, targeting 32 nm node and below. Philips Extreme UV GmbH and XTREME technologies GmbH have developed DPP (Discharge Produced Plasma) Alpha tools which run in operation at several locations in the world. In this paper the status of the Alpha Sn-DPP tools as developed by Philips Extreme UV GmbH will be given. The Alpha DPP tools provide a good basis for the development and engineering of the Beta tools and in the future of the HVM tools. The first Beta source has been designed and first light has been produced. Engineering steps will folow to optimize this first generation Beta Sn-DPP source. HVM tools target EUV power levels from 200W to 500W in IF. In this paper we show that the power requried for HVM can be generated with Sn-DPP sources. Based on Alpha Sn-DPP sources we show that repetition frequency and generated EUV pulse energy is scalable up to power levels that match the HVM requirements.
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