Mr. Edwin A. Pell Profile

Edwin A. Pell

Application Engineering Consultant at Mentor Graphics Corp

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Publications (1)

Proceedings Article | 12 July 2002 Paper

Model-based OPC for sub-resolution assist feature enhanced layouts

Pat LaCour, Edwin Pell, Yuri Granik, Thuy Do

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475689

KEYWORDS: SRAF, Optical proximity correction, Calibration, Model-based design, Photomasks, Lithography, Data modeling, Manufacturing, Resolution enhancement technologies, Printing

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