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Edward Lauder
at Intel Corp
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Publications (1)
Proceedings Article | 6 December 2004 Paper
Reduction of radial CD errors and Cr loading effects in 90-nm binary NCAR mask process through chrome etch DOE
Jian Ma, Chaoyang Li, Larry Bassist, Matthew Pekney, Nathan Wilcox, Jeff Farnsworth, Edward Lauder, B. Krishnakumar
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568423
KEYWORDS: Critical dimension metrology, Photomasks, Chromium, Etching, Diffractive optical elements, Semiconducting wafers, Reticles, Phase modulation, Optical proximity correction, Manufacturing
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