Cubic nitrides are candidate materials for next-generation optoelectronic applications as they lack internal fields and promise to cover large parts of the electromagnetic spectrum from the deep UV towards the mid infrared. This demands high-quality epitaxial growth of c-GaN as base material. We demonstrate the influence of pre-growth treatments and c- AlN buffer layers on the quality of c-GaN grown on 3C-SiC/Si substrates by molecular beam epitaxy (MBE). Optimized parameters yield extremely small surface roughness values below 1 nm of phase pure c-GaN layers with very limited stacking fault densities. Structural properties have been studied by X-ray diffraction and atomic force microscopy and surpasses the current standards, which allows for growth of more complex quantum structures for device application.
Cubic InxGa1-xN alloys are a candidate material for optoelectronic applications because they lack internal polarization fields and promise to cover a vast range of emission wavelengths. However, the large discrepancy in interatomic spacing and growth temperatures of c-GaN and c-InN hinder InxGa1-xN-growth. We report cubic InxGa1-xN layers grown by plasmaassisted MBE and achieve continuous miscibility of the indium content x(In) over the whole composition range. X-ray diffraction precisely monitors the composition, phase purity and miscibility of the thin films. Furthermore, we discuss the impact of the indium content on the crystallinity. Complementary, low-temperature photoluminescence studies elucidate the optical response of cubic InxGa1-xN layers.
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