In common with most disciplines surface metrology is having to evolve in order to meet the new requirements demanded
by miniaturization and the increased use of semi conductor planar technology. Changes are taking place in theory as well
as in the other constituents of an engineering design such as material properties and new manufacturing processes. In
this paper a number of issues will be discussed. They will be by no means a comprehensive list but sufficient will be
investigated to give an idea of the nature and scope on the problem. Amongst the topics covered will be nomenclature,
some mechanical properties, force balance etc. There will be a look back at the way in which surface metrology evolved
to see if lessons can be learned.
Some problems associated with surface metrology instrumentation and theory are discussed. In particular problems in Nanometrology are highlighted with reference to Markov processes and fractal analysis. A systems approach to surface characterization is suggested.
The paper explores the effect that a reduction in the scale of size has on performance, manufacture and metrology. It is shown that there are profound changes in which sometimes the meanings of operations and parameters diverge.
To control processes capable of accuracy and surface finish requires surface measuring equipment of a very high order of capability and versatility. Metrology has also required a similar change in discipline to include more physical considerations than was considered necessary only a few years ago. In what follows some of the existing trends are reviewed.
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