Dr. David C. Shaver Profile

Dr. David C. Shaver

Division Head at MIT Lincoln Lab

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Author

Publications (6)

Proceedings Article | 13 May 2011 Paper

MBE back-illuminated silicon Geiger-mode avalanche photodiodes for enhanced ultraviolet response

Daniel Schuette, Richard Westhoff, Joseph Ciampi, Gayatri Perlin, Douglas Young, Brian Aull, Robert Reich, David Shaver

Proceedings Volume 8033, 80330D (2011) https://doi.org/10.1117/12.887736

KEYWORDS: Silicon, Sensors, Semiconducting wafers, Avalanche photodetectors, Ultraviolet radiation, Avalanche photodiodes, Quantum efficiency, Photons, Wafer bonding, Reflectivity

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Proceedings Article | 19 May 2005 Paper

1-micrometer Geiger-mode detector development

J. Donnelly, K. McIntosh, D. Oakley, A. Napoleone, S. Groves, S. Vernon, L. Mahoney, K. Molvar, J. Mahan, J. Aversa, E. Duerr, Z. Liau, B. Aull, D. Shaver

Proceedings Volume 5791, (2005) https://doi.org/10.1117/12.609691

KEYWORDS: Avalanche photodetectors, Sensors, Photons, Microlens array, Silicon, LIDAR, Semiconducting wafers, Readout integrated circuits, Detector development, Quantum efficiency

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Proceedings Article | 1 June 1992 Paper

Small-field stepper for 193-nm lithography process development

David Shaver, David Craig, C. Marchi, Mark Hartney, Francis Goodall

Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130366

KEYWORDS: Lithography, Optical lithography, Photomasks, Microscopes, Optical alignment, Semiconducting wafers, Excimer lasers, Lens design, Sensors, Interferometers

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Proceedings Article | 1 December 1991 Paper

Laser-induced metal deposition and laser cutting techniques for fixing IC design errors

David Shaver, Scott Doran, Mordechai Rothschild, Jan Sedlacek

Proceedings Volume 1596, (1991) https://doi.org/10.1117/12.51010

KEYWORDS: Laser cutting, Metals, Excimer lasers, Platinum, Pulsed laser operation, Aluminum, Laser ablation, Deposition processes, Laser applications, Ion beams

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Proceedings Article | 1 June 1991 Paper

Polysilyne resists for 193 nm excimer laser lithography

Roderick Kunz, Patricia Bianconi, Mark Horn, R. Paladugu, David Shaver, David Smith, Charles Freed

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46373

KEYWORDS: Etching, Reactive ion etching, Silicon, Polymers, Ultraviolet radiation, Lithography, Image processing, Semiconducting wafers, Plasma, Oxygen

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Proceedings Article | 1 June 1990 Paper

Silylation processes for 193-nm excimer laser lithography

Mark Hartney, Roderick Kunz, Daniel Ehrlich, David Shaver

Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20119

KEYWORDS: Silicon, Diffusion, Etching, Silicon films, Reactive ion etching, Oxygen, Plasma, Photoresist processing, Lithography, Plasma etching

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Showing 5 of 6 publications

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