The possibility of processing information with light has been the driving force behind the quest for all-optical logic gates. Leveraging silicon photonics processing technology, we show optically excited exciton-polariton condensation at ambient conditions in fully integrated metamaterial-based high-index contrast grating microcavities filled with an organic polymer. By coupling two resonators and exploiting seeded polariton condensation, we demonstrate ultrafast all-optical transistor action on a picosecond timescale and cascadability of the device concept. This paves the way for more complex ultrafast all-optical logic circuits operating at room temperature.
Highly ordered nanocrystal (NC) assemblies, namely superlattices (SLs), have been investigated as a building block of novel bright (quantum) light sources because of their unique collective emission process, so-called superfluorescence. Thus far, the primary preparation method for perovskite NC SLs has been drying-mediated self-assembly, in which the NCs spontaneously assemble into SLs while the solvent evaporates. However, this method does not give control over the position and size of assemblies. Hence, it has been challenging to place NC assemblies in photonic device structures. Here, we demonstrate template-assisted self-assembly of CsPbBr3 NCs to achieve precise control of the geometrical features of NC assemblies. A solution of NCs is drop-casted on a substrate with hollow, lithographically-defined template structures made from SiO2. We allow slow solvent evaporation and remove excess NCs from the substrate surface afterward. Thus, NCs only remain in the templates, and the position and size of these NC assemblies can be controlled by changing the design of the hollow structures. We performed time-resolved photoluminescence measurements on these NC assemblies and observed signatures of collective photon emission. Our results provide an important step forward for the development of optical devices that harness embedded perovskite NC assemblies.
Electron and ion beam lithographies were used to fabricate and/or functionalize large scale - millimetre footprint - micro-optical elements: coupled waveguide-resonator structures on silicon-on-insulator (SOI) and THz antennas on low temperature grown LT-GaAs. Waveguide elements on SOI were made without stitching errors using a fixed beam moving stage approach. THz antennas were created using a three-step litography process. First, gold THz antennas defined by standard mask projection lithography were annealed to make an ohmic contact on LT-GaAs and post-processing with Ga-ion beam was used to define nano-gaps and inter digitised contacts for better charge collection. These approaches show the possibility to fabricate large footprint patterns with nanoscale precision features and overlay accuracy. Emerging 3D nanofabrication trends are discussed.
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