This article presents white light interferometry as a new application for the nanopositioning and nanomeasuring machine
(NPMM). The NPMM was developed under the leadership of the Institute of Process Measurement and Sensor
Technology at the Technische Universität Ilmenau (Germany) and allows highly exact dimensional and traceable
positioning with a resolution of 0.1 nm within a volume of 25 mm x 25 mm x 5 mm.
An application of white light interferometry was developed on the basis of these features which can utilize the device's
very high precision and large effective range, which enables the stitching of partitioned results without overlapping
measurements and expensive matching methods.
In order to extract height data from the interferograms, a robust, precise and fast method using matched filters in the
frequency domain has been put into practice. The filter templates are calculated according to a model function or are
directly sampled from the light source power spectrum, which has been previously analyzed once. Thus, light sources
with different spectral forms can be used.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.