Dr. Chun-Kuang Chen Profile

Dr. Chun-Kuang Chen

Director at ASML Taiwan Ltd

SPIE Involvement:

Author

Area of Expertise:

Photo-Lithography , EUVL

Publications (22)

SPIE Journal Paper | 14 June 2023 Open Access

Ultra-fast aerial image simulation algorithm using wavelength scaling and fast Fourier transformation to speed up calculation by more than three orders of magnitude

Tsai-Sheng Gau, Po-Hsiung Chen, Burn J. Lin, Fu-Hsiang Ko, Chun-Kung Chen, Anthony Yen

JM3, Vol. 22, Issue 02, 023201, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.2.023201

KEYWORDS: Fourier transforms, Computer simulations, Light sources and illumination, Diffraction, Ultrafast phenomena, Lithography, Matrices, Optical proximity correction, Partial coherence, Optical lithography

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Proceedings Article | 28 April 2023 Presentation + Paper

Computational evaluation of critical logical metal layers of pitch 20-24nm and the aberration sensitivity in high NA EUV single patterning

Weimin Gao, Chun-Kuang Chen, Joerg Zimmermann

Proceedings Volume 12495, 1249509 (2023) https://doi.org/10.1117/12.2658871

KEYWORDS: Metals, Extreme ultraviolet, Source mask optimization, Nanoimprint lithography, Personal protective equipment, Critical dimension metrology, Logic, Optical lithography, Surface plasmons, Lithography

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Proceedings Article | 1 December 2022 Paper

A study of patterning 36nm-pitch logic contact holes in a metal oxide resist using a high-reflectance phase-shifting mask that results in image reversal

Shih-En Tseng, Chun-Kuang Chen, Dong-Seok Nam, Will Lin, Anthony Yen

Proceedings Volume 12293, 122930C (2022) https://doi.org/10.1117/12.2642302

KEYWORDS: Photomasks, Semiconducting wafers, Calibration, Data modeling, Line width roughness, Logic, Optical lithography, Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes

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Proceedings Article | 26 May 2022 Presentation + Paper

Computational lithographic study of 0.55 NA EUV single patterning for metal layers for the 2nm logic node and beyond

Weimin Gao, Boer Zhu, Tsann-Bim Chiou, Shih-En Tseng, Will Lin, Chun-Kuang Chen, Joerg Zimmermann, Anthony Yen

Proceedings Volume 12052, 120520G (2022) https://doi.org/10.1117/12.2614225

KEYWORDS: Source mask optimization, Metals, Nanoimprint lithography, Extreme ultraviolet, Photomasks, Logic, Optical lithography, Molybdenum, SRAF, Extreme ultraviolet lithography

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Proceedings Article | 20 March 2018 Presentation + Paper

Cross-platform (NXE-NXT) machine-to-machine overlay matching supporting next node chip manufacturing

Theo Thijssen, Marcel Beckers, Albert Mollema, Leon Levasier, Alexander Padi, Chia-Wei Hung, Hsiao-Lan Chen, Laurens van Bokhoven, Niels Lammers, Jean Phillippe van Damme, Floris Teeuwisse, Robin Tijssen, Wilson Tzeng, Cathy Wang, Marcel Mastenbroek, Harald Vos, Ting-Ju Yueh, Miao-Chi Chen , Hsueh-Hung Wu, Shin-Rung Peng, Chun-Kuang Chen, L. J. Chen , Kevin Cheng, John Lin

Proceedings Volume 10587, 1058709 (2018) https://doi.org/10.1117/12.2297387

KEYWORDS: Pellicles, Reticles, Deep ultraviolet, Overlay metrology, Extreme ultraviolet, Scanners, Distortion, Extreme ultraviolet lithography, Manufacturing, Semiconducting wafers

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Proceedings Article | 15 March 2016 Paper

Inverse polarizer on immersion lithography mask

Minfeng Chen, Shuo-Yen Chou, Chun-Kuang Chen, Ru-Gun Liu, Tsai-Sheng Gau

Proceedings Volume 9780, 97801R (2016) https://doi.org/10.1117/12.2225127

KEYWORDS: Diffraction, Photomasks, Polarizers, Dielectric polarization, Image quality, Polarization, Transmittance, Immersion lithography, Lithography, Diffraction gratings

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Proceedings Article | 17 March 2008 Paper

Influence of shot noise on CDU with DUV, EUV, and E-beam

Zhih-Yu Pan, Chun-Kuang Chen, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 6924, 69241K (2008) https://doi.org/10.1117/12.776776

KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Electron beam lithography, Deep ultraviolet, Lithography, Extreme ultraviolet lithography, Raster graphics, Quantum physics, Photons, Semiconducting wafers

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Proceedings Article | 27 March 2007 Paper

Immersion defect reduction, part I: analysis of water leaks in an immersion scanner

Fu-Jye Liang, Hsing Chang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn J. Lin

Proceedings Volume 6520, 65204U (2007) https://doi.org/10.1117/12.712531

KEYWORDS: Semiconducting wafers, Scanners, Digital watermarking, Particles, Superposition, Microfluidics, Printing, Computer simulations, System identification, Immersion lithography

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Proceedings Article | 26 March 2007 Paper

Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

Lin-Hung Shiu, Fu-Jye Liang, Hsing Chang, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 6520, 652012 (2007) https://doi.org/10.1117/12.712527

KEYWORDS: Particles, Semiconducting wafers, Scanning electron microscopy, Digital watermarking, Printing, Defect inspection, Polymers, Immersion lithography, Neodymium, Wafer-level optics

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SPIE Journal Paper | 1 January 2007 Open Access

Defect reduction with special routing for immersion lithography

Fu-Jye Liang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau, Burn Lin

JM3, Vol. 6, Issue 01, 010501, (January 2007) https://doi.org/10.1117/12.10.1117/1.2718941

KEYWORDS: Semiconducting wafers, Particles, Immersion lithography, Printing, Scanners, Double patterning technology, Liquids, Digital watermarking, Wafer testing, Reticles

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SPIE Journal Paper | 1 October 2005

Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles

Shinn-Sheng Yu, Burn Lin, Anthony Yen, Chih-Ming Ke, Te-Chih Huang, Bang-Chein Ho, Chun-Kuang Chen, Tsai-Sheng Gau, Hung-Chang Hsieh, Yao-Ching Ku

JM3, Vol. 4, Issue 04, 043003, (October 2005) https://doi.org/10.1117/12.10.1117/1.2137967

KEYWORDS: Thin films, Wave propagation, Magnetism, Optical lithography, Critical dimension metrology, Interfaces, Scanners, Absorption, Lithography, Multilayers

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Proceedings Article | 12 May 2005 Paper

Mask polarization effects in hyper NA systems

Chun-Kuang Chen, Tsai-Sheng Gau, Lin-Hung Shiu, Burn Lin

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602032

KEYWORDS: Polarization, Photomasks, Diffraction, Optical lithography, Image acquisition, Semiconducting wafers, Projection systems, Immersion lithography, Computer simulations, Lenses

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Proceedings Article | 12 May 2005 Paper

Characterization of ArF immersion process for production

Jeng-Horng Chen, Li-Jui Chen, Tun-Ying Fang, Tzung-Chi Fu, Lin-Hung Shiu, Yao-Te Huang, Norman Chen, Da-Chun Oweyang, Ming-Che Wu, Shih-Che Wang, John Lin, Chun-Kuang Chen, Wei-Ming Chen, Tsai-Sheng Gau, Burn Lin, Richard Moerman, Wendy Gehoel-van Ansem, Eddy van der Heijden, Fred de Jong, Dorothe Oorschot, Herman Boom, Martin Hoogendorp, Christian Wagner, Bert Koek

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602025

KEYWORDS: Semiconducting wafers, Scanners, Immersion lithography, Particles, Lithography, Overlay metrology, Prototyping, Microfluidics, Water, Finite element methods

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Proceedings Article | 6 December 2004 Paper

Phase-defocus windows for alternating phase shifting mask

Fu-Jye Liang, Chun-Kuang Chen, Jaw-Jung Shin, Jan-Wen You, Chun-Heng Lin, Zhin-Yu Pan, King-Chang Shu, Tsai-Sheng Gau, Burn Lin

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569216

KEYWORDS: Photomasks, Semiconducting wafers, Phase shifting, Phase shifts, Photomask technology, Optical lithography, Quartz, Etching, Mask making

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Proceedings Article | 28 May 2004 Paper

Study of line edge roughness using continuous wavelet transform for 65-nm node

Lin-Hung Shiu, Chun-Kuang Chen, Tsai-Sheng Gau, Burn-Jeng Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536649

KEYWORDS: Line edge roughness, Critical dimension metrology, Lithography, Continuous wavelet transforms, Photoresist processing, Image processing, Optical lithography, Polymers, Photomasks, Modulation

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Proceedings Article | 28 May 2004 Paper

General scaling law of optical lithography: optical theory

Chun-Kuang Chen, Tsai-Sheng Gau, Li-Jui Chen, Chi-Chuang Lee, Jaw-Jung Shin, Anthony Yen, Burn-Jeng Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536667

KEYWORDS: Optical lithography, Optics manufacturing, Manufacturing

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SPIE Journal Paper | 1 April 2004

Mask error tensor and causality of mask error enhancement for low-k₁ imaging: theory and experiments

Chun-Kuang Chen, Tsai-Sheng Gau, Jaw-Jung Shin, Ru-Gun Liu, Shinn-Sheng Yu, Anthony Yen, Burn-Jeng Lin

JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1669508

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing, Error analysis, Scanners, Diffraction, Solids, Lithography, Electroluminescence

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SPIE Journal Paper | 1 January 2004

Image characterization of bubbles in water for 193-nm immersion lithography-far-field approach

Tsai-Sheng Gau, Chun-Kuang Chen, Burn-Jeng Lin

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1630602

KEYWORDS: Scattering, Water, Refractive index, Mie scattering, Rayleigh scattering, Image acquisition, Spherical lenses, Immersion lithography, Statistical analysis, Photons

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SPIE Journal Paper | 1 October 2002

Customized illumination aperture filter design for through-pitch focus latitude enhancement of deep submicron contact hole printing

Shuo-Yen Chou, Jen-Chung Lou, Fu-Jye Liang, Tsai-Sheng Gau, Ru-Gun Liu, Chun-Kuang Chen, Chih-Ming Lai

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1502261

KEYWORDS: Diffraction, Printing, Photomasks, Phase shifts, Lithographic illumination, Visualization, Monochromatic aberrations, Lithography, Optical lithography, Resolution enhancement technologies

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Proceedings Article | 30 July 2002 Paper

Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments

Chun-Kuang Chen, Tsai-Sheng Gau, Jaw-Jung Shin, Ru-Gun Liu, Shinn Sheng Yu, Anthony Yen, Burn Lin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474574

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Mask making, Lithography, Tolerancing, Scanners, Optical lithography, Error analysis, Semiconductor manufacturing

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Proceedings Article | 30 July 2002 Paper

Model-based OPC for 0.13-um contacts using 248-nm Att PSM

Jaw-Jung Shin, T. Wu, Chun-Kuang Chen, R. Liu, Yao Ching Ku, Burn Lin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474511

KEYWORDS: Optical proximity correction, Critical dimension metrology, Photomasks, Model-based design, Semiconducting wafers, Cadmium, Data modeling, Logic, Lithography, Phase shifts

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Proceedings Article | 14 September 2001 Paper

Trench pattern lithography for 0.13- and 0.10-um logic devices at 248-nm and 193-nm wavelengths

Ying-Ying Wang, Hua Tai Lin, Shinn Sheng Yu, Chun-Kuang Chen, Yao Ching Ku, Anthony Yen, Burn Lin

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435728

KEYWORDS: Atrial fibrillation, Optical proximity correction, Lithography, Photomasks, Lithographic illumination, Photoresist materials, Optical lithography, Logic devices, Optics manufacturing, SRAF

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Showing 5 of 22 publications

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