Dr. Christophe Constancias Profile

Dr. Christophe Constancias

at MINATEC

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 20 June 2024 Presentation + Paper

A multi-gas sensor for environmental gases: towards miniaturization with mid-infrared Quantum Cascade Lasers (QCL) and silicon integration of photoacoustic cells

Christophe Constancias, Badhise Ben Bakir, Maeva Doron, Olivier Lartigue, Sonia Messaoudène, Adrien Poizat, Sarah Renault, Jules Skubich, Marion Volpert, Olivier Masson, Clément Garaffa, Julien Marianne, Eric Gautier, Séverine Moune, Edouard Régis, Philippe Labazuy

Proceedings Volume 12999, 129990J (2024) https://doi.org/10.1117/12.3016917

KEYWORDS: Quantum cascade lasers, Photoacoustic spectroscopy, Miniaturization, Silicon, Gases, Carbon dioxide, Mid infrared, Environmental sensing, Sensors

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Proceedings Article | 5 March 2022 Presentation + Paper

Room temperature spectral characterization of direct band gap Ge0.85Sn0.15 LEDs and photodiodes

C. Cardoux, L. Casiez, N. Pauc, V. Calvo, N. Coudurier, P. Rodriguez, J. Richy, P. Barritault, O. Lartigue, C. Constancias, M. Frauenrath, J.M. Hartmann, A. Chelnokov, O. Gravrand, V. Reboud

Proceedings Volume 12006, 120060A (2022) https://doi.org/10.1117/12.2608964

KEYWORDS: Light emitting diodes, Sensors, Germanium, Calibration, Silicon, FT-IR spectroscopy, Spectral calibration, Tin, Photodiodes

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Proceedings Article | 9 September 2019 Paper

Visible to mid-infrared integrated sensors for air quality measurement

S. Boutami, G. Jobert, P. Barritault, J. G. Coutard, M. Fournier, J. M. Fédéli, P. Labeye, A. Marchant, J. Skubich, A. Teulle, O. Lartigue, E. Lorent, A. Glière, C. Constancias, S. Nicoletti, C. Jamois, C. Seassal, L. Duraffourg

Proceedings Volume 11088, 110880R (2019) https://doi.org/10.1117/12.2529262

KEYWORDS: Sensors, Silicon, Particles, Mid-IR, Quantum cascade lasers, Photoacoustic spectroscopy, Scattering, Absorption, Light scattering, Acoustics

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Proceedings Article | 19 March 2015 Paper

"Fast" and "thick" e-beam resists exposed with multi-beam tool at 5 keV for implants and mature nodes: experimental and simulated model study

Aurélien Fay, Ndeye Thiam, Marie-Laure Cordini, Isabelle Servin, Christophe Constancias, Ludovic Lattard, Laurent Pain

Proceedings Volume 9423, 94231Q (2015) https://doi.org/10.1117/12.2085832

KEYWORDS: Lithography, Electron beam lithography, Silicon, Point spread functions, Scanning electron microscopy, Critical dimension metrology, 3D modeling, Information technology, Etching, Monte Carlo methods

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Proceedings Article | 21 March 2012 Paper

Ultimate lithographic performances of advanced resists CAR or non-CAR resist?

Jan Frederik Van Steenbergen, Noboru Ootsuka, Xavier Buch, Béatrice Icard, Claire Sourd, Christophe Constancias, Bernard Dalzotto, Laurent Pain

Proceedings Volume 8323, 83232M (2012) https://doi.org/10.1117/12.916624

KEYWORDS: Photoresist materials, Lithography, Line width roughness, Electron beam lithography, Extreme ultraviolet, Chemically amplified resists, Electron beams, Semiconducting wafers, Silicon, Chemistry

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SPIE Journal Paper | 1 July 2011

Overlay measurements by Mueller polarimetry in back focal plane

Clément Fallet, Tatiana Novikova, Martin Foldyna, Sandeep Manhas, Bicher Haj Ibrahim, Antonello De Martino, Cyril Vannuffel, Christophe Constancias

JM3, Vol. 10, Issue 03, 033017, (July 2011) https://doi.org/10.1117/12.10.1117/1.3626852

KEYWORDS: Overlay metrology, Polarimetry, Error analysis, Silicon, Semiconducting wafers, Metrology, Optical testing, Microscopes, Critical dimension metrology, Mueller matrices

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Proceedings Article | 20 April 2011 Paper

Overlay measurements by Mueller polarimetry in the back focal plane

Tatiana Novikova, Clément Fallet, Martin Foldyna, Sandeep Manhas, Bicher Haj Ibrahim, Antonello De Martino, Cyril Vannuffel, Christophe Constancias

Proceedings Volume 7971, 797115 (2011) https://doi.org/10.1117/12.879499

KEYWORDS: Overlay metrology, Polarimetry, Metrology, Error analysis, Microscopes, Silicon, Critical dimension metrology, Manufacturing, Semiconducting wafers, Optical testing

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Proceedings Article | 4 April 2011 Paper

IMAGINE: an open consortium to boost maskless lithography take off: first assessment results on MAPPER technology

L. Pain, B. Icard, M. Martin, C. Constancias, S. Tedesco, P. Wiedeman, A. Farah, B. Kampherbeek, C. Pieczulewski, H. Kandrashov

Proceedings Volume 7970, 79700Y (2011) https://doi.org/10.1117/12.881286

KEYWORDS: Lithography, Photoresist processing, Semiconducting wafers, Maskless lithography, Manufacturing, Reliability, Silicon, Electrons, Projection systems, High volume manufacturing

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Proceedings Article | 23 March 2010 Paper

Identification, modeling, and observation of disturbing effects in EUV interferometer lithography

M. Saib, M. Besacier, C. Constancias, P. Michallon

Proceedings Volume 7636, 763628 (2010) https://doi.org/10.1117/12.851868

KEYWORDS: Diffraction gratings, Extreme ultraviolet, Diffraction, Interferometers, Lithography, Near field diffraction, Photomasks, Extreme ultraviolet lithography, Photons, Interferometry

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Proceedings Article | 18 March 2009 Paper

Development of resist process for 5-KV multi-beam technology

B. Icard, D. Rio, P. Veltman, B. Kampherbeek, C. Constancias, L. Pain

Proceedings Volume 7271, 72710R (2009) https://doi.org/10.1117/12.813687

KEYWORDS: Photoresist processing, Semiconducting wafers, Polymethylmethacrylate, Electron beam lithography, Electrons, Line edge roughness, Lithography, Standards development, Semiconductors, Manufacturing

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Proceedings Article | 28 January 2009 Paper

Superconducting single photon detectors for ultrasensitive visible and IR detection

Roch Espiau de Lamaestre, Laurent Maingault, Laurent Frey, Christophe Constancias, Paul Cavalier, Jean Claude Villégier, Philippe Odier, Jean Philippe Poizat

Proceedings Volume 7249, 72490Q (2009) https://doi.org/10.1117/12.806198

KEYWORDS: Quantum efficiency, Sensors, Superconductors, Polarization, Sapphire, Absorption, Single photon, Signal detection, Resistance, Nanowires

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Proceedings Article | 21 March 2008 Paper

Design requirements for a stand alone EUV interferometer

Ph. Michallon, C. Constancias, A. Lagrange, B. Dalzotto

Proceedings Volume 6921, 69213Y (2008) https://doi.org/10.1117/12.771586

KEYWORDS: Extreme ultraviolet, Interferometers, Lithography, Optical design, Extreme ultraviolet lithography, Line edge roughness, Photomasks, Synchrotrons, Light sources, Collimation

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Proceedings Article | 23 March 2006 Paper

Phase-shift mask for EUV lithography

C. Constancias, M. Richard, D. Joyeux, J. Chiaroni, R. Blanc, J. Robic, E. Quesnel, V. Muffato

Proceedings Volume 6151, 61511W (2006) https://doi.org/10.1117/12.655583

KEYWORDS: Phase shifts, Etching, Reflectivity, Multilayers, Photomasks, Interferometers, Extreme ultraviolet, Extreme ultraviolet lithography, Silicon, Silica

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Showing 5 of 13 publications

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