Dr. Ching-Hsu Chang Profile

Dr. Ching-Hsu Chang

Principal Engineer at United Microelectronics Corp

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Author

Publications (5)

Proceedings Article | 28 March 2017 Paper

Asymmetry overlay correction for lithography processes

Ming-Jui Chen, Chun-Chi Yu, Tang Chun Weng, C.-H. Chang, Charlie Chen, Chia Ching Lin, En Chuan Lio, Chia Hsiang Yu

Proceedings Volume 10145, 1014525 (2017) https://doi.org/10.1117/12.2257631

KEYWORDS: Data modeling, Solids, Scanners, Stars, Mathematical modeling

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Proceedings Article | 28 May 2004 Paper

Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography

Ching-Hsu Chang, Jochen Schacht, Benjamin Lin, Kuei-Chun Hung, I. Hsuing Huang

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535167

KEYWORDS: Critical dimension metrology, Photomasks, Image transmission, Reticles, Lithography, Phase shifts, Scanning electron microscopy, Binary data, Monochromatic aberrations, Transmittance

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Proceedings Article | 28 May 2004 Paper

Calibration of OPC models for multiple focus conditions

Jochen Schacht, Klaus Herold, Rainer Zimmermann, J. Andres Torres, Wilhelm Maurer, Yuri Granik, Ching-Hsu Chang, G. Kuei-Chun Hung, Benjamin Szu-Min Lin

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534123

KEYWORDS: Calibration, Data modeling, Process modeling, Optical proximity correction, Photoresist processing, Image processing, Metrology, Thin films, Image acquisition, Error analysis

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Proceedings Article | 30 July 2002 Paper

Contact hole photo process improvement by multiple exposures with matched illumination settings

Yeong-Song Yen, I-Hsiung Huang, Jiunn-Ren Huang, Kuei-Chun Hung, Chi-fa Ku, Ching-Hsu Chang, Cheng Fang, Paul Yen

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474540

KEYWORDS: Photomasks, Optical lithography, Semiconducting wafers, Lithographic illumination, Lithography, Resolution enhancement technologies, Image processing, Finite element methods, Microelectronics, Printing

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Proceedings Article | 14 September 2001 Paper

Lithography challenges of dual-damascence process in 0.13 um era

Li-Jui Chen, Lin-Hung Shiu, Chern-Shyan Tsai, Ching-Hsu Chang, Tsung-Kuei Kang, Shuo-Yen Chou

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435791

KEYWORDS: Reflectivity, Etching, Image processing, Lithography, Photoresist processing, Optical lithography, Critical dimension metrology, Coating, Polymers, Dielectrics

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