Dr. ByeongSoo Lee
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 24 March 2017 Paper
Young Ha Kim, Jonghoon Jang, Byeong Soo Lee, Hyunwoo Hwang, Youngsun Nam, Jeong-Heung Kong, Young Seog Kang, Se-Yeon Jang, Bart Paarhuis, Jeroen van der Wielen, Barry Moest, Joris Jongen, Stefan Weichselbaum, Niek Verbeek, Marco Stavenga, Roelof de Graaf, Richard Droste
Proceedings Volume 10147, 1014717 (2017) https://doi.org/10.1117/12.2259792
KEYWORDS: Reticles, Scanners, Distortion, HVAC controls, Optical alignment, Control systems, Thermal effects, Temperature metrology, Semiconducting wafers, Overlay metrology, Calibration

Proceedings Article | 24 March 2017 Presentation + Paper
Bram van Hoof, Arjan Holscher, Ralf Gommers, Jeroen Cottaar, Marcel Raas, Samah Khalek, Jan van Kemenade, Maarten Voncken, Roelof de Graaf, Elliot Oti, Stefan Weichselbaum, Richard Droste, ByeongSoo Lee, Chansam Chang, Young Seog Kang, Young Ha Kim, Jeong-Heung Kong, Jong Hoon Jang, YoungSun Nam, Hyunwoo Hwang
Proceedings Volume 10147, 101471A (2017) https://doi.org/10.1117/12.2259794
KEYWORDS: Semiconducting wafers, Sensors, Time metrology, Scanners, Optical alignment, Calibration, Wafer testing, Overlay metrology, Metrology, Computer programming

Proceedings Article | 15 March 2016 Paper
Jonghoon Jang, ByeongSoo Lee, Young Seog Kang, Chansam Chang, Jeong-Heung Kong, Young Ha Kim, Wim Bouman, Roelof de Graaf, Stefan Weichselbaum, Richard Droste, Wim de Boeij, Bart van Bussel, Patrick Neefs, Arij Rijke
Proceedings Volume 9780, 97800X (2016) https://doi.org/10.1117/12.2220588
KEYWORDS: Lithography, Lithographic illumination, Optical alignment, Scanners, Optical lithography, Image enhancement, Reticles, Electronics

Proceedings Article | 15 March 2016 Paper
Byeong Soo Lee, Young Ha Kim, Hyunwoo Hwang, Jeongjin Lee, Jeong Heung Kong, Young Seog Kang, Bart Paarhuis, Haico Kok, Roelof de Graaf, Stefan Weichselbaum, Richard Droste, Christopher Mason, Igor Aarts, Wim de Boeij
Proceedings Volume 9780, 97800B (2016) https://doi.org/10.1117/12.2220587
KEYWORDS: Optical alignment, Signal processing, Overlay metrology, Optical lithography, Optics manufacturing, Opacity, Materials processing, Sensors, Wafer testing, Near infrared, Image processing

Proceedings Article | 26 March 2015 Paper
Proceedings Volume 9426, 942614 (2015) https://doi.org/10.1117/12.2086936
KEYWORDS: Semiconducting wafers, Logic, Reticles, Overlay metrology, Control systems, Statistical analysis, Process control, Electronics, Optical alignment, Optical lithography

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