Mr. Byeong Seon Park Profile

Byeong Seon Park

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 10 April 2024 Poster + Paper

Multi-wavelength continuous-bias DBO metrology for improved ADI process-robustness

Jungmin Lee, Inbeom Lim, Byeong Seon Park, Changyeon Lee, Mincheol Kwak, Jeongjin Lee, Seung Yoon Lee, Chan Hwang, Jay Mummery, Bruno Gregorio Almeida, Han-Gyeol Park, Mi-Yeon Baek, Kemal Dahha, Ki-Youn Lee, Se-Hui Lee, Arno van Leest, Thao Nguyen, Marc Noot, Stefan Smith-Meerman, Koen van Witteveen, Jong-Hyuk Yim, Olger Zwier

Proceedings Volume 12955, 129553P (2024) https://doi.org/10.1117/12.3012950

KEYWORDS: Overlay metrology, Signal to noise ratio, Denoising, Semiconducting wafers, Metrology, Inspection, Phase shifts, Optical gratings, Industrial applications, Diffraction

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years