CONFERENCE PROCEEDINGS
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Anna Szucs
at STMicroelectromics
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 24 March 2016 Paper
Resist 3D model based OPC for 28nm metal process window enlargement
P. Fanton, J. C. Le Denmat, C. Gardiola, A. Pelletier, F. Foussadier, C. Gardin, J. Planchot, A. Szucs, O. Ndiaye, N. Martin, L. Depre, F. Robert
Proceedings Volume 9778, 97781U (2016) https://doi.org/10.1117/12.2218916
KEYWORDS: 3D modeling, Optical proximity correction, Metals, 3D metrology, Optical lithography, Evolutionary algorithms, Photomasks, Scanning electron microscopy, Critical dimension metrology, Image processing, Etching, Calibration, Artificial intelligence, Reliability
SPIE Journal Paper | 10 April 2015
Patterning critical dimension control for advanced logic nodes
Bertrand Le-Gratiet, Jean De-Caunes, Maxime Gatefait, Auguste Lam, Alain Ostrovsky, Jonathan Planchot, Vincent Farys, Julien Ducoté, Marc Mikolajczak, Vincent Morin, Nicolas Chojnowski, Frank Sundermann, Alice Pelletier, Regis Bouyssou, Cedric Monget, Jean-Damien Chapon, Bastien Orlando, Laurene Babaud, Céline Lapeyre, Emek Yesilada, Anna Szucs, Jean-Christophe Michel, Latifa Desvoivres, Onintza Ros Bengoechea, Pascal Gouraud
JM3, Vol. 14, Issue 02, 021103, (April 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.2.021103
KEYWORDS: Semiconducting wafers, Optical lithography, Critical dimension metrology, Process control, Photomasks, Etching, Logic, Metrology, Lithography, Optical proximity correction
Proceedings Article | 31 March 2014 Paper
Advanced OPC Mask-3D and Resist-3D modeling
A. Szucs, J. Planchot, V. Farys, E. Yesilada, L. Depre, S. Kapasi, C. Gourgon, M. Besacier, O. Mouraille, F. Driessen
Proceedings Volume 9052, 905208 (2014) https://doi.org/10.1117/12.2047281
KEYWORDS: 3D modeling, Calibration, Data modeling, Photomasks, Lithography, Semiconducting wafers, Scanning electron microscopy, Atomic force microscopy, Process control, Etching
Proceedings Article | 12 April 2013 Paper
Best focus shift mitigation for extending the depth of focus
A. Szucs, J. Planchot, V. Farys, E. Yesilada, C. Alleaume, L. Depre, R. Dover, C. Gourgon, M. Besacier, A. Nachtwein, P. Rusu
Proceedings Volume 8683, 868313 (2013) https://doi.org/10.1117/12.2011114
KEYWORDS: Wavefronts, Photomasks, Calibration, Scanning electron microscopy, Semiconducting wafers, Scanners, Lithography, Metals, Optical proximity correction, Source mask optimization
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