TiO2 is a very promising material for integrated photonics due to its high refractive index (~2.3 at 633 nm), wide transparency window from the visible to the mid-infrared and high non-linear refractive index. However, to date, high propagation losses hinder its utilization in real-life applications. In this work, we carry out a systematic study of the different fabrication processes involved in the realization of TiO2 channel waveguides, including RF sputter deposition, electron-beam lithography and thermal annealing, showing film losses below 1 dB/cm for wavelengths above 633 nm and channel losses of 1-1.5 dB/cm at 1550 nm.
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