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Allen Chang
Director, Patterning Technology at Applied Materials Taiwan Ltd
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 13 March 2012 Paper
Process requirements for pitch splitting LELE double patterning at advanced logic technology node
R. Peng, I. Huang, H. Liu, H. J. Lee, John Lin, Arthur Lin, Allen Chang, Benjamin Szu-Min Lin, Ivan Lalovic
Proceedings Volume 8326, 83260X (2012) https://doi.org/10.1117/12.916420
KEYWORDS: Double patterning technology, Critical dimension metrology, Etching, Lithography, Optical lithography, Photomasks, Photoresist materials, Logic, Optical simulations, Cadmium
Proceedings Article | 4 March 2010 Paper
Laser spectrum requirements for tight CD control at advanced logic technology nodes
R. C. Peng, H. J. Lee, John Lin, Arthur Lin, Allen Chang, Benjamin Szu-Min Lin
Proceedings Volume 7640, 76402C (2010) https://doi.org/10.1117/12.846516
KEYWORDS: Critical dimension metrology, Optical lithography, Light sources, SRAF, Control systems, Logic, Logic devices, Laser applications, Reticles, Laser scanners
Proceedings Article | 4 December 2008 Paper
CD control enhancement by laser bandwidth stabilization for advanced lithography application
R. Peng, Tony Wu, K. W. Chang, C. P. Yeh, H. Liu, H. Lee, John Lin, Allen Chang, Benjamin Lin
Proceedings Volume 7140, 714041 (2008) https://doi.org/10.1117/12.804616
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Laser stabilization, Gas lasers, Signal processing, Beam controllers, Control systems, Laser applications, Lithography, Photoresist materials
Proceedings Article | 12 March 2008 Paper
Effects of laser bandwidth on tool to tool CD matching
Bo-Yun Hsueh, Hung-Yi Wu, Louis Jang, Met Yeh, Chen-Chin Yang, George K.C. Huang, Chun-Chi Yu, Allen Chang
Proceedings Volume 6924, 69244K (2008) https://doi.org/10.1117/12.773567
KEYWORDS: Critical dimension metrology, Lithography, Semiconducting wafers, Imaging systems, Laser scanners, 3D scanning, Laser stabilization, Tunable lasers, Spectroscopy, Coherence (optics)
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