In recent years, nano, opto, and bio-electronics have seen rapid advancements due to improved fabrication tools. Devices in these fields require functional structures with arbitrary patterns and feature sizes ≤100 nm. Although commercial extreme UV lithography has the potential to fabricate these nanoscale patterns, economic and technological factors limits their up-scalable manufacturing. Here we report a low-cost, large-area compatible mass-manufacturing method to produce moulds and consecutively soft-stamps with nanoscale features. The method relies on the use of our technique called adhesion lithography (a-lith)1 to realize moulds of patterned metal electrodes which are separated laterally by a distance (length) that can range between 1-100 nm. The lateral size of these electrodes (width), on the other hand, can vary from hundreds of nanometers to meters. Soft stamps, which can be used to replicate multiple copies of high aspect ratio planar nanoscale patterns on arbitrary substrates, were successfully prepared from such a mould. Further, the same nanogap metal electrodes made from a-lith used as a mask to etch the underneath Si substrate, resulting in nanofluidic channels used for bio-applications such as DNA and bio-molecule imaging and sensing.
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