Advanced environmental control as a key component in the development of ultrahigh accuracy ex situ metrology for x-ray optics

Valeriy V. Yashchuk; Nikolay A. Artemiev; Ian Lacey; Wayne R. McKinney; Howard A. Padmore

doi:10.1117/1.OE.54.10.104104

12 October 2015 Advanced environmental control as a key component in the development of ultrahigh accuracy ex situ metrology for x-ray optics

Valeriy V. Yashchuk, Nikolay A. Artemiev, Ian Lacey, Wayne R. McKinney, Howard A. Padmore

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Optical Engineering, Vol. 54, Issue 10, 104104 (October 2015). https://doi.org/10.1117/1.OE.54.10.104104

Abstract

The advent of fully coherent free-electron laser and diffraction-limited synchrotron radiation storage ring sources of x-rays is catalyzing the development of new ultrahigh accuracy metrology methods. To fully exploit these sources, metrology needs to be capable of determining the figure of an optical element with subnanometer height accuracy. The major limiting factors of the current absolute accuracy of ex situ metrology are drift errors due to temporal instabilities of the lab’s environmental conditions and systematic errors inherent to the metrology instruments. Here, we discuss in detail work at the Advanced Light Source X-Ray Optics Laboratory on building of advanced environmental control that is a key component in the development of ultrahigh accuracy ex situ metrology for x-ray optics. By a few examples, we show how the improvement of the environmental conditions in the lab allows us to significantly gain efficiency in performing ex situ metrology with high-quality x-ray mirrors. The developed concepts and approaches, included in the design of the new X-Ray Optics Laboratory, are described in detail. These data are essential for construction and successful operation of a modern metrology facility for x-ray optics, as well as high-precision measurements in many fields of experimental physics.

CC BY: © The Authors. Published by SPIE under a Creative Commons Attribution 4.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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Valeriy V. Yashchuk, Nikolay A. Artemiev, Ian Lacey, Wayne R. McKinney, and Howard A. Padmore "Advanced environmental control as a key component in the development of ultrahigh accuracy ex situ metrology for x-ray optics," Optical Engineering 54(10), 104104 (12 October 2015). https://doi.org/10.1117/1.OE.54.10.104104

Published: 12 October 2015

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