1 June 1996 Equal-thickness-fringe multiple reflection interferometer for ultra-high-speed interference recording
Jian Lu, Xiao-Wu Ni, Anzhi He
Author Affiliations +
An equal-thickness-fringe multiple reflection interferometer for ultra-high-speed multiframe recording is reported. The initial process of laser-produced plasma on a dielectric film layer is explored using this interferometer, and five interferograms with 30-ns frame intervals are obtained.
Jian Lu, Xiao-Wu Ni, and Anzhi He "Equal-thickness-fringe multiple reflection interferometer for ultra-high-speed interference recording," Optical Engineering 35(6), (1 June 1996). https://doi.org/10.1117/1.600611
Published: 1 June 1996
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Cited by 2 scholarly publications.
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KEYWORDS
Interferometers

Reflection

Plasma

Dielectrics

Light sources

Reflectivity

Mirrors

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