Microlenses fabricated by melting a photoresist on a base layer

Stefan Haselbeck; Horst Schreiber; Johannes Schwider; Norbert Streibl

doi:10.1117/12.135845

1 June 1993 Microlenses fabricated by melting a photoresist on a base layer

Stefan Haselbeck, Horst Schreiber, Johannes Schwider, Norbert Streibl

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Optical Engineering, Vol. 32, Issue 6, (June 1993). https://doi.org/10.1117/12.135845

Abstract

We report on the fabrication of novel refractive microlens arrays in photoresists, in particular on lenses with numerical apertures ranging from 0.1 to 0.3. A base layer technique is described that makes it possible to fabricate lower numerical aperture lenses in resist, compared with microlenses on glass substrates. The wave aberrations were measured in a Mach-Zehnder interferometer. Diffraction-limited performance was achieved for a numerical aperture of 0.2 and a lens diameter of 270 μm.

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Stefan Haselbeck, Horst Schreiber, Johannes Schwider, and Norbert Streibl "Microlenses fabricated by melting a photoresist on a base layer," Optical Engineering 32(6), (1 June 1993). https://doi.org/10.1117/12.135845

Published: 1 June 1993

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