Subresolution assist features in extreme ultraviolet lithography

Deniz Civay; Erik A. Verduijn; Chris H. Clifford; Pawitter J. Mangat; Thomas I. Wallow

doi:10.1117/1.JMM.14.2.023501

2 April 2015 Subresolution assist features in extreme ultraviolet lithography

Deniz Civay, Erik A. Verduijn, Chris H. Clifford, Pawitter J. Mangat, Thomas I. Wallow

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 14, Issue 2, 023501 (April 2015). https://doi.org/10.1117/1.JMM.14.2.023501

Abstract

Lithographic critical dimension (CD) printing variability can be easily captured with a CD uniformity measurement; however, minimizing the variability is a challenging task that requires manipulation of many variables. Contact hole variability has a direct impact on device performance, while via variability affects metal area scaling and design. Subresolution assist features (SRAFs) have been used in the past to improve lithographic printing variability. SRAFs enhance the image log slope of nearby features but are not intended to print themselves. The role of SRAFs in extreme ultraviolet is explored here.

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Deniz Civay, Erik A. Verduijn, Chris H. Clifford, Pawitter J. Mangat, and Thomas I. Wallow "Subresolution assist features in extreme ultraviolet lithography," Journal of Micro/Nanolithography, MEMS, and MOEMS 14(2), 023501 (2 April 2015). https://doi.org/10.1117/1.JMM.14.2.023501

Published: 2 April 2015

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