Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles

Shinn-Sheng Yu; Burn Lin; Anthony Yen; Chih-Ming Ke; Te-Chih Huang; Bang-Chein Ho; Chun-Kuang Chen; Tsai-Sheng Gau; Hung-Chang Hsieh; Yao-Ching Ku

doi:10.1117/1.2137967

1 October 2005 Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles

Shinn-Sheng Yu, Burn Lin, Anthony Yen, Chih-Ming Ke, Te-Chih Huang, Bang-Chein Ho, Chun-Kuang Chen, Tsai-Sheng Gau, Hung-Chang Hsieh, Yao-Ching Ku

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 4, Issue 4, 043003 (October 2005). https://doi.org/10.1117/1.2137967

Abstract

The functional dependence of a resist critical dimension (CD) with respect to resist thickness for a general absorptive thin-film stack in the case of oblique incidence is derived analytically with the rigorous electromagnetic theory. Based on obtained results, we discuss those thin-film effects related to CD control, such as the swing effect, bulk effect, etc., especially in the regime of high numerical aperture optical lithography.

©(2005) Society of Photo-Optical Instrumentation Engineers (SPIE)

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Shinn-Sheng Yu, Burn Lin, Anthony Yen, Chih-Ming Ke, Te-Chih Huang, Bang-Chein Ho, Chun-Kuang Chen, Tsai-Sheng Gau, Hung-Chang Hsieh, and Yao-Ching Ku "Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles," Journal of Micro/Nanolithography, MEMS, and MOEMS 4(4), 043003 (1 October 2005). https://doi.org/10.1117/1.2137967

Published: 1 October 2005

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