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30 September 2013 Special Section Guest Editorial: Alternative Lithographic Technologies
William M. Tong, Douglas J. Resnick, Ricardo Ruiz
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, Issue 3, 031101 (September 2013). https://doi.org/10.1117/1.JMM.12.3.031101
Abstract
This year marks the second year of the Special Section on Alternative Lithographic Technologies. Our issue features papers on emerging lithographic technologies that are potentially both cost-effective and scalable to high-volume manufacturing (HVM).
© The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.
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William M. Tong, Douglas J. Resnick, and Ricardo Ruiz "Special Section Guest Editorial: Alternative Lithographic Technologies," Journal of Micro/Nanolithography, MEMS, and MOEMS 12(3), 031101 (30 September 2013). https://doi.org/10.1117/1.JMM.12.3.031101
Published: 30 September 2013
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KEYWORDS
Lithography
High volume manufacturing
Directed self assembly
Explosives
Extreme ultraviolet lithography
Metrology
Molecular self-assembly
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