1 October 2002 Symmetry of spatial-dispersion-induced birefringence and its implications for CaF2 ultraviolet optics
Author Affiliations +
Abstract
The discovery of a significant spatial-dispersion-induced birefringence (intrinsic birefringence) in CaF2 at ultraviolet wavelengths has had a major impact on the design of 157 nm lithography systems, requiring complete redesign of the optics to take account of the imaging aberrations resulting from the birefringence and the accompanying index anisotropy. This intrinsic birefringence phenomena results from a symmetry-breaking effect of the finite wave vector of the photon on the symmetry of the light-matter interaction in fluorite-structure cubic crystals. As a follow-up to our original concise report of measurements and theory of the effect in CaF2 and BaF2, we present here a more detailed analysis of the theory, focusing on the symmetry and its consequences. We also provide the full directional dependence of the effect in useful closed forms. We analyze the implications for precision optical design with CaF2 optical elements, and discuss qualitatively the approaches being considered to compensate for it.
©(2002) Society of Photo-Optical Instrumentation Engineers (SPIE)
John H. Burnett, Zachary H. Levine, Eric L. Shirley, and John H. Bruning "Symmetry of spatial-dispersion-induced birefringence and its implications for CaF2 ultraviolet optics," Journal of Micro/Nanolithography, MEMS, and MOEMS 1(3), (1 October 2002). https://doi.org/10.1117/1.1503350
Published: 1 October 2002
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CITATIONS
Cited by 26 scholarly publications.
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KEYWORDS
Birefringence

Crystals

Anisotropy

Polarization

Dielectrics

Wave propagation

Lithography

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