Basic Chemistry of DNQ/Novolak Resists

doi:10.1117/3.2265072.ch2

Book: Diazonaphthoquinone-based Resists

Author(s): Ralph R. Dammel

Published: 1993

https://doi.org/10.1117/3.2265072.ch2

Author Affiliations +

Abstract

The inhibition of novolak dissolution by a diazonaphthoquinone sulfonate discussed in the introduction is only a little more than half the story: the formation of the readily soluble indene carboxylic acid photoproduct leads to a substantial increase of the dissolution rate even beyond that of the pure matrix resin. Both the novolak and DNQ structures in commercial materials have been optimized to maximize this effect; modern resists show a dissolution rate ratio of well over three orders of magnitude between exposed and unexposed resist regions with DNQ loadings of approx. 20% of solids.