Integrated atomic metrology with analog/digital lithography and spectroscopy: a future in nano a quantum fabrication

Tito L. Busani; Isaac Stricklin; John Randall; Ivo Rangelow

doi:10.1117/12.3010007

10 April 2024 Integrated atomic metrology with analog/digital lithography and spectroscopy: a future in nano a quantum fabrication

Tito L. Busani, Isaac Stricklin, John Randall, Ivo Rangelow

Author Affiliations +

Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560K (2024) https://doi.org/10.1117/12.3010007
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

A new set of tools and techniques are constantly developed and researched in order to assist metrology and lithography into the nano meter and atomic domain that involve nano scale devices and now, more than ever, quantum devices. Those techniques are built to serve a new generation of lithographic and metrology systems with the same goals of the system they came before them: insuring control, precision and confidence in the fabrication process. Our solution is the design and fabrication of a Multipurpose Atomic Force Microscopy (AFM) probe that integrates UV lithography, field emission lithography and digital lithography in a single system that allows patterning generation with atomic accuracy, real time inspection with atomic resolution and nano meter Raman Spectroscopy.The multifunction probe has shown strong durability, 365 nm laser emission with 1.5 nm FWHM, lithography patterning as low as 7 nm in field emission lithography configuration and 2 atom lithography in scanning tunneling mode.

Conference Presentation

Citation Download Citation

Tito L. Busani, Isaac Stricklin, John Randall, and Ivo Rangelow "Integrated atomic metrology with analog/digital lithography and spectroscopy: a future in nano a quantum fabrication", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560K (10 April 2024); https://doi.org/10.1117/12.3010007

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