Poster
10 April 2024 Measurement of tin diffusion coefficients through molecular hydrogen
Gordon Jameson Crouse, Andrew Herschberg, Nathan Bartlett, Niels Braaksma, David Ruzic
Author Affiliations +
Conference Poster
Abstract
Extreme ultraviolet (EUV) lithography sources use large amounts of tin to create ultraviolet light. Accurate modeling of neutral tin transport relies on knowledge of the diffusion coefficients of neutral tin through molecular hydrogen. This work experimentally determined the diffusion coefficients of tin through molecular hydrogen vapour at different tin temperatures and ambient pressures. A known amount of tin is evaporated into a pipe with a known flow profile at a known ambient pressure. Deposited tin is measured downstream of the pipe with a quartz-crystal microbalance (QCM). A variety of analytical and numerical coefficients were then compared in order to find the diffusion coefficient.
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gordon Jameson Crouse, Andrew Herschberg, Nathan Bartlett, Niels Braaksma, and David Ruzic "Measurement of tin diffusion coefficients through molecular hydrogen", Proc. SPIE PC12953, Optical and EUV Nanolithography XXXVII, PC1295312 (10 April 2024); https://doi.org/10.1117/12.3013100
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KEYWORDS
Tin

Diffusion

Hydrogen

Pipes

Analytic models

Extreme ultraviolet

Modeling

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