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13 March 2024 Dual spatial light modulator enabled full light field control for microsphere photolithography
Edward C. Kinzel, Chen Zhu
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Proceedings Volume PC12900, Emerging Digital Micromirror Device Based Systems and Applications XVI; PC1290007 (2024) https://doi.org/10.1117/12.3003117
Event: SPIE OPTO, 2024, San Francisco, California, United States
Abstract
Microsphere photolithography (MPL) uses self-assembled hexagonal close-packed microspheres as optical elements to produce photonic nanojets (PNJ) in a layer of photoresist. The information required for hierarchical patterning is embedded in the illumination light field. In this work, dual spatial light modulator (SLM) system is employed to attain precise control over the light field in MPL, which can significantly enhance the flexibility and efficiency of the fabrication process. A digital micro device (DMD) located at the front Fourier plane is used to control the AOI at the back focal plane. A liquid crystal (LC) device is placed in the intermediate image plane to regulate the local illumination intensity, which is subsequently projected onto the image stage. Both the DMD and SLM encode the illumination AOI and intensity received by each microsphere. The resolution and control processes of the system are investigated. The capability is demonstrated by creating functional hierarchical metasurfaces.
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Edward C. Kinzel and Chen Zhu "Dual spatial light modulator enabled full light field control for microsphere photolithography", Proc. SPIE PC12900, Emerging Digital Micromirror Device Based Systems and Applications XVI, PC1290007 (13 March 2024); https://doi.org/10.1117/12.3003117
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KEYWORDS
Microspheres
Optical lithography
Light sources and illumination
Spatial light modulators
Control systems
Digital Light Processing
Digital micromirror devices
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