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15 April 2024 Advanced microlens origination by thermal reflow
Frédéric Zanella, Mohamed Lahmar, Christian Schneider, Luka Ciric, Guillaume Basset
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Proceedings Volume PC12898, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII; PC1289805 (2024) https://doi.org/10.1117/12.3003227
Event: SPIE OPTO, 2024, San Francisco, California, United States
Abstract
Microlenses, and especially microlens arrays (MLA), are commonly used as stand-alone optical components, for beam homogenization and shaping. Or integrated as wafer-level optics (WLO), either on top of light sources for beam shaping, or on top of light or image sensors as light concentrators. Many techniques are available to originate the microlens shape: laser ablation, grayscale lithography, two photon absorption, etc. One common way is to pattern photoresist pillars by photolithography and to melt (reflow) them. We report new advances in thermal reflow mastering addressing its intrinsic limitations and expanding the design capabilities of reflow-based MLAs.
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Frédéric Zanella, Mohamed Lahmar, Christian Schneider, Luka Ciric, and Guillaume Basset "Advanced microlens origination by thermal reflow", Proc. SPIE PC12898, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII, PC1289805 (15 April 2024); https://doi.org/10.1117/12.3003227
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KEYWORDS
Microlens
Optical sensors
Photoresist materials
Vertical cavity surface emitting lasers
Wafer level optics
Optical properties
Semiconducting wafers
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