The Multi-Beam Mask Writer (MBMW) by IMS Nanofabrication has become the standard for photo mask patterning.
The new MBMW-100 Flex extends its capabilities for mature and advanced mask node applications, offering advantages over traditional Variable Shaped Beam (VSB) writers a favorable cost of ownership. It covers a wide range of node requirements, supports various write modes, and brings the benefits of multi-beam technology to mature mask nodes. It enables the use of advanced correction techniques and low-sensitivity resists, improving pattern fidelity. Based on the successful MBMW-201, it ensures reliability and productivity. The MBMW-100 Flex is an exciting development in multi-beam technology, providing superior capabilities and overcoming VSB technology limitations.
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