Presentation
22 November 2023 MBMW-100 flex, the 1st electron multi-beam mask writer for mature and advanced mask nodes
Mathias Tomandl, Christof Klein, Hans Loeschner, Elmar Platzgummer
Author Affiliations +
Abstract
The Multi-Beam Mask Writer (MBMW) by IMS Nanofabrication has become the standard for photo mask patterning. The new MBMW-100 Flex extends its capabilities for mature and advanced mask node applications, offering advantages over traditional Variable Shaped Beam (VSB) writers a favorable cost of ownership. It covers a wide range of node requirements, supports various write modes, and brings the benefits of multi-beam technology to mature mask nodes. It enables the use of advanced correction techniques and low-sensitivity resists, improving pattern fidelity. Based on the successful MBMW-201, it ensures reliability and productivity. The MBMW-100 Flex is an exciting development in multi-beam technology, providing superior capabilities and overcoming VSB technology limitations.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mathias Tomandl, Christof Klein, Hans Loeschner, and Elmar Platzgummer "MBMW-100 flex, the 1st electron multi-beam mask writer for mature and advanced mask nodes", Proc. SPIE PC12751, Photomask Technology 2023, PC127510I (22 November 2023); https://doi.org/10.1117/12.2688257
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KEYWORDS
Industrial applications

Optical proximity correction

Vestigial sideband modulation

Line edge roughness

Lithography

Logic

Nanofabrication

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