Analysis of plasmonic topological edge states using dual-layered complementary structures by FDTD method

Shihhui Gilbert Chang; Hung-Yu Chang; Jia-Sheng Liu; Yu-Hsing Lin; Yi-Chien Lin

doi:10.1117/12.2676580

6 October 2023 Analysis of plasmonic topological edge states using dual-layered complementary structures by FDTD method

Shihhui Gilbert Chang, Hung-Yu Chang, Jia-Sheng Liu, Yu-Hsing Lin, Yi-Chien Lin

Proceedings Volume PC12646, Metamaterials, Metadevices, and Metasystems 2023; PC126461P (2023) https://doi.org/10.1117/12.2676580
Event: SPIE Nanoscience + Engineering, 2023, San Diego, California, United States

Conference Poster

Abstract

Plasmonic topological insulators using dual layer hexagonal complementary structure provide TE/TM pseudospin edge states. We use finite-difference time-domain method to analyze its nontrivial band structure and the transmission efficiency of topological protected edges states. Chern numbers are calculated by both Berry curvature and Willson loop method. The effect of defects, sharp bendings and scattering loss in one-way transmission are also discussed.

Citation Download Citation

Shihhui Gilbert Chang, Hung-Yu Chang, Jia-Sheng Liu, Yu-Hsing Lin, and Yi-Chien Lin "Analysis of plasmonic topological edge states using dual-layered complementary structures by FDTD method", Proc. SPIE PC12646, Metamaterials, Metadevices, and Metasystems 2023, PC126461P (6 October 2023); https://doi.org/10.1117/12.2676580

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