Presentation
13 March 2023 High rejection filters based on cascaded ring resonators in a 300 mm silicon photonics platform
Léopold Virot, Annalara Ferrara, Quentin Wilmart, Mattéo Galli, Daniele Bajoni, Ségolène Olivier
Author Affiliations +
Proceedings Volume PC12426, Silicon Photonics XVIII; PC124260C (2023) https://doi.org/10.1117/12.2646814
Event: SPIE OPTO, 2023, San Francisco, California, United States
Abstract
The advent of 300mm fabrication tools and immersion lithography for photonics may change the game and the practical use of ring resonator based devices. We implemented such ring resonators on our 300 mm SOI platform for Silicon photonics using immersion lithography. We show that such technology offers unprecedented level of uniformity and reproducibility within a die but also from die to die. Such performances allowed us to combine and cascade ring resonators to fabricate high rejection filters in Coupled Resonator Optical Waveguide (CROW) configurations. Such high rejection filters are thus very promising candidates for quantum photonics, and more particularly in circuits based on photons pair generation, where pump rejection filters with over 100dB of rejection are needed.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Léopold Virot, Annalara Ferrara, Quentin Wilmart, Mattéo Galli, Daniele Bajoni, and Ségolène Olivier "High rejection filters based on cascaded ring resonators in a 300 mm silicon photonics platform", Proc. SPIE PC12426, Silicon Photonics XVIII, PC124260C (13 March 2023); https://doi.org/10.1117/12.2646814
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KEYWORDS
Resonators

Silicon photonics

Immersion lithography

Optical filters

Waveguides

Modulation

Photonics

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