Possible underlayer dependent CD and overlay variation due to different heat absorption with EUV exposure

Wonyoung Choi; Heechang Ko; Jiwon Kang; Janggun Park; Minwoo Kim; Junhyeong Lee; Hyekeun Oh

doi:10.1117/12.2643047

31 October 2022 Possible underlayer dependent CD and overlay variation due to different heat absorption with EUV exposure

Wonyoung Choi, Heechang Ko, Jiwon Kang, Janggun Park, Minwoo Kim, Junhyeong Lee, Hyekeun Oh

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Proceedings Volume PC12292, International Conference on Extreme Ultraviolet Lithography 2022; PC122920R (2022) https://doi.org/10.1117/12.2643047
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

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Wonyoung Choi, Heechang Ko, Jiwon Kang, Janggun Park, Minwoo Kim, Junhyeong Lee, and Hyekeun Oh "Possible underlayer dependent CD and overlay variation due to different heat absorption with EUV exposure", Proc. SPIE PC12292, International Conference on Extreme Ultraviolet Lithography 2022, PC122920R (31 October 2022); https://doi.org/10.1117/12.2643047

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