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12 May 2020 Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum)
Lauren M. Otto, Aeron T. Hammack, Shaul Aloni, D. Frank Ogletree, Deirdre L. Olynick, Scott Dhuey, Bethanie J. H. Stadler, Adam M. Schwartzberg
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Proceedings Volume 9919, Nanophotonic Materials XIII; 991918 (2020) https://doi.org/10.1117/12.2573754
Event: SPIE Nanoscience + Engineering, 2016, San Diego, California, United States
Abstract
Publisher’s Note: This paper, originally published on 3 October 2016, was replaced with a corrected version on 12 May 2020. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance.
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Lauren M. Otto, Aeron T. Hammack, Shaul Aloni, D. Frank Ogletree, Deirdre L. Olynick, Scott Dhuey, Bethanie J. H. Stadler, and Adam M. Schwartzberg "Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum)", Proc. SPIE 9919, Nanophotonic Materials XIII, 991918 (12 May 2020); https://doi.org/10.1117/12.2573754
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KEYWORDS
Atomic layer deposition
Plasmonics
Tin
Gases
Nanophotonics
Plasma
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