This paper will demonstrate methods to expand the usable design space on dipole-like processes such as unidirectional gate and SADP processes by utilizing the follow-up cut mask to improve the process window. Traditional mask enhancement means for improving the process window in this design realm will be compared to this new cut-mask approach. The unique advantages and disadvantages of the cut-mask solution will be discussed in contrast to those customary methods. |
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Cited by 1 scholarly publication.
Photomasks
Printing
Photovoltaics
Optical lithography
Lithography
Double patterning technology
Analog electronics