Growth Of Diamond By Rf Plasma Assisted Chemical Vapor Deposition

Duane E. Meyer; Natale J. Ianno; John A. Woollam; A. B. Swartzlander; A. J. Nelson

doi:10.1117/12.948142

17 January 1989 Growth Of Diamond By Rf Plasma Assisted Chemical Vapor Deposition

Duane E. Meyer, Natale J. Ianno, John A. Woollam, A. B. Swartzlander, A. J. Nelson

Proceedings Volume 0969, Diamond Optics; (1989) https://doi.org/10.1117/12.948142
Event: 32nd Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1988, San Diego, CA, United States

Abstract

Diamond particles have been produced by inductively coupled radio frequency plasma assisted chemical vapor deposition. Analysis indicates that particles having a thin graphitic surface, as well as diamond particles with no surface coatings have been deposited. Scanning electron microscopy analysis shows that particles are deposited on a pedestal which Auger spectroscopy indicates to be graphitic. This phenomenon has not been previously reported in the literature.

Citation Download Citation

Duane E. Meyer, Natale J. Ianno, John A. Woollam, A. B. Swartzlander, and A. J. Nelson "Growth Of Diamond By Rf Plasma Assisted Chemical Vapor Deposition", Proc. SPIE 0969, Diamond Optics, (17 January 1989); https://doi.org/10.1117/12.948142

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