High-reflectance La/B-based multilayer mirror for 6.x-nm wavelength

Dmitry Kuznetsov; Andrey Yakshin; Marko Sturm; Robbert van de Kruijs; Eric Louis; Fred Bijkerk

doi:10.1117/12.2199427

26 August 2015 High-reflectance La/B-based multilayer mirror for 6.x-nm wavelength

Dmitry Kuznetsov, Andrey Yakshin, Marko Sturm, Robbert van de Kruijs, Eric Louis, Fred Bijkerk

Proceedings Volume 9588, Advances in X-Ray/EUV Optics and Components X; 958806 (2015) https://doi.org/10.1117/12.2199427
Event: SPIE Optical Engineering + Applications, 2015, San Diego, California, United States

Abstract

For future photolithography processes, the wavelength of 6 nm may offer improved imaging specs. The perspective of this technology however, will depend critically on the performance of multilayer reflective mirrors, which are likely to be based on La/B. One of the issues is formation of LaxBy compounds at the interfaces, which decreases the optical contrast and reduce the reflectivity. To prevent such chemical interaction, passivation of La by nitrogen has been investigated. We successfully synthesized LaN layers that resulted in a new world record reflectivity of 64% at 6.6 nm at near normal incidence. This reduces the gap to the target of 70%, desired for a next generation lithography.

Citation Download Citation

Dmitry Kuznetsov, Andrey Yakshin, Marko Sturm, Robbert van de Kruijs, Eric Louis, and Fred Bijkerk "High-reflectance La/B-based multilayer mirror for 6.x-nm wavelength", Proc. SPIE 9588, Advances in X-Ray/EUV Optics and Components X, 958806 (26 August 2015); https://doi.org/10.1117/12.2199427

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KEYWORDS

Lanthanum

Reflectivity

Interfaces

Local area networks

Mirrors

Nitrogen

Extreme ultraviolet

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