Fabrication and qualification of roughness reference samples for industrial testing of surface roughness levels below 0.5 nm Sq

O. Faehnle; E. Langenbach; F. Zygalsky; F. Frost; R. Fechner; A. Schindler; M. Cumme; H. Biskup; C. Wünsche; R. Rascher

doi:10.1117/12.2189790

27 August 2015 Fabrication and qualification of roughness reference samples for industrial testing of surface roughness levels below 0.5 nm Sq

O. Faehnle, E. Langenbach, F. Zygalsky, F. Frost, R. Fechner, A. Schindler, M. Cumme, H. Biskup, C. Wünsche, R. Rascher

Author Affiliations +

Proceedings Volume 9575, Optical Manufacturing and Testing XI; 957512 (2015) https://doi.org/10.1117/12.2189790
Event: SPIE Optical Engineering + Applications, 2015, San Diego, California, United States

Abstract

Applying reactive ion beam etching (RIBE) processes at the Leibniz Institute of Surface Modification (IOM), several reference samples to be used in industry for calibrating of roughness testing equipment have been generated with the smoothest sample featuring 0.1 nm rms Sq. Subsequently these reference samples have been measured cross-site applying atomic force microscopy (AFM), white light interferometry (WLI), Nomarski¹ microscopy (NM) and scatterometry (iTIRM²) determining the appropriate range of measurable rms surface roughness for each industrial measuring device.

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O. Faehnle, E. Langenbach, F. Zygalsky, F. Frost, R. Fechner, A. Schindler, M. Cumme, H. Biskup, C. Wünsche, and R. Rascher "Fabrication and qualification of roughness reference samples for industrial testing of surface roughness levels below 0.5 nm Sq", Proc. SPIE 9575, Optical Manufacturing and Testing XI, 957512 (27 August 2015); https://doi.org/10.1117/12.2189790

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