Paper
4 May 2015 355nm and 1064nm laser damage of quartz glass
Xun Gao, Qi Li, Haijun Chi, Jingquan Lin
Author Affiliations +
Proceedings Volume 9543, Third International Symposium on Laser Interaction with Matter; 95430K (2015) https://doi.org/10.1117/12.2182011
Event: Third International Symposium on Laser Interaction with Matter, 2014, Jiangsu, China
Abstract
In this paper, the laser damage thresholds of the quartz glass with/without HF acid etching are investigated induced by the wavelength of the 355nm and 1064nm respectively. Laser-induced damage threshold of the quartz glass can be improved by optimizing the HF concentration and etched time. The experimental results shown that laser induced damage thresholds of quartz glass for 355nm and 1064nm were 7.1×108 W/cm2 and 1.15×109 W/cm2 respectively, after HF acid treatment with the 10% HF concentration and etched time 15 minutes, laser induced damage thresholds of quartz glass for 355nm changed to 1.29×109 W/cm2 and improved 81.7%, while for 1064nm changed to 1.73×109 W/cm2 and improved 50.4%. The surface damage morphologies of quartz glass induced by the 355nm and 1064nm with/without HF acid etching were comparative analyzed. Finally, the laser induced damaged mechanisms of quartz glass for 355nm and 1064nm were given.
© (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xun Gao, Qi Li, Haijun Chi, and Jingquan Lin "355nm and 1064nm laser damage of quartz glass", Proc. SPIE 9543, Third International Symposium on Laser Interaction with Matter, 95430K (4 May 2015); https://doi.org/10.1117/12.2182011
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Cited by 2 scholarly publications.
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KEYWORDS
Glasses

Quartz

Hydrogen fluoride lasers

Laser induced damage

Etching

HF etching

Laser damage threshold

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